A novel pattering technique based mostly on ‘resist nanokirigami’

Photoresist-based patterning methods have been standardized for many years for the reason that invention of photolithography. Nevertheless, there are nonetheless main challenges within the processing of sure purposeful constructions. For instance, the usual resist-based excessive decision patterning course of normally requires point-by-point publicity of the goal resist constructions, resulting in extraordinarily low throughput and an unavoidable proximity impact when defining multiscale patterns; high-energy beam irradiation can simply trigger injury to the supplies; and the negative-tone-resist-based lift-off course of is difficult.

Not too long ago, the journal Nationwide Science Evaluate revealed the outcomes of Professor Duan Huigao’s analysis group from Hunan College. The crew proposed and demonstrated a brand new resist patterning technique, known as “resist nano-kirigami.” The define of the goal construction is uncovered on the resist, and the surplus resist movie is selectively mechanically stripped. In contrast with conventional electron beam lithography, this scheme has the next core benefits:

1. It might successfully scale back the publicity space within the manufacturing course of (for instance, for a disk construction with a radius of 400 µm, the publicity space of this scheme could be lowered by 5 orders of magnitude in comparison with the standard electron beam lithography technique), which tremendously improves the processing effectivity and achieves environment friendly fabrication of cross-scale “macro-micro-nano” advanced purposeful constructions which can be tough to attain by conventional options.
2. Solely the outlines of the goal construction within the optimistic resist PMMA are uncovered; each the positive- and negative-tone could be obtained by selective peeling of the PMMA.

The technique supplies a brand new patterning answer that expands the household of lithography strategies and can play a major function in fabricating multiscale purposeful constructions.